Used as an etching gas in semiconductor production.

Used as an etching gas in semiconductor production.

In semiconductor manufacturing, sulfur hexafluoride is used as an etching gas in fine micromachining processes.

Used in plasma etching process of integrated circuits, also used as laser gas, low temperature refrigerant, solvent, lubricant, insulating material, coolant of infrared detector tube.

Used for ion etching of silicon layers in semiconductor chip manufacturing, widely used in advanced processes up to 14nm and 7nm.

Used as an etching gas for nitride films in the semiconductor industry.