In the semiconductor field, the main applications are in the preparation of semiconductor precursor materials and insulating films.

In the semiconductor industry, it is mainly used as a solvent and cleaning agent for photoresist.

In the semiconductor industry, it is mainly used as substrate material and tungsten film growth intermediate.

In the field of semiconductors, the application mainly includes doping and ion implantation links.

Used in the CVD/ALD process for the production of hafnium-containing precursor materials, such as tetrakis(ethylmethylamino)hafnium(IV) (TEMAH), hafnium alcohol salts, and others.

Its use in the semiconductor field is mainly reflected in its use as a semiconductor precursor material, mainly used in the manufacture of zirconium dioxide, zirconium-ammonia complexes and other compounds.