The main applications of indium iodide in semiconductors include as a conductor, dopant and catalyst.

It is the main raw material for the preparation of ITO films and Ⅲ ~ Ⅴ semiconductor materials, but also the basic raw material for the synthesis of organic indium series compounds, can also be used as a catalyst for organic reactions, in organic synthesis and the electronics industry has a wide range of applications.

Used as a precursor for the synthesis of indium tin oxide (ITO).

In the semiconductor field, it is mainly used as a catalyst and electronic material.

It is an important precursor for the preparation of cobalt metal, cobalt nitride, cobalt silicide, etc., especially for the application of cobalt barrier/liner, co-covering layer and eutectic seed layer with excellent performance.

In the semiconductor field, the main application is in the deposition of titanium dioxide (TiO₂) and titanium nitride (TiN) films in the chemical vapor deposition (CVD) process.